Plasma Chemistry and Plasma Processing
Plasma Chem Plasma Process
ISSN (printed): 0272-4324. ISSN (electronic): 1572-8986.
Plasma Chemistry and Plasma Processing is an international journal for the publication of original papers on fundamental research and new developments in plasma chemistry and plasma processing. The broad coverage of experimental analytical and numerical studies includes both non-equilibrium ('cold') and equilibrium ('hot') plasmas. Pertinent diagnostic studies are also encouraged. Typical subject areas are: etching deposition of thin films and protective coatings annealing polymerization preparation of amorphous and crystalline materials surface modification techniques for making electronic devices and techniques for analytical chemistry. Other topics of interest include volume reactions in inorganic and organic systems thermal plasma synthesis metallurgy fuming coal gasification and desulfurization spheroidization spraying surfacing and modeling of plasma reactors.
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